University of Cambridge Electron Beam Lithography Facility

Facility providing electron-beam lithography services to semiconductor physics, optics and microelectronics research groups, and to related industrial users. Electron-beam lithography is a well-established means of fabricating the smallest lithographic features required for research and niche production semiconductor and optical technologies. The tools themselves are expensive (>£2m) and require considerable experience to obtain good results, and so are well suited to being providing as a centralised facility in a university setting.